1. Deposition. - 1. 1 Introduction. - 1. 2 Thermodynamics and kinetics. - 1. 3 The deposition process. - 1. 4 Gas-phase and surface processes. - 1. 5 Reactor geometries. - 1. 6 Reaction. - 1. 7 Deposition from disilane. - 1. 8 Deposition of doped films. - 1. 9 Conformai deposition. - 1. 10 Enhanced deposition techniques. - 1. 11 Summary. - 2. Structure. - 2. 1 Nucleation. - 2. 2 Surface diffusion and structure. - 2. 3 Evaluation techniques. - 2. 4 Grain structure. - 2. 5 Grain orientation. - 2. 6 Optical properties. - 2. 7 Thermal conductivity. - 2. 8 Mechanical properties. - 2. 9 Oxygen contamination. - 2. 10 Etching. - 2. 11 Structural stability. - 2. 12 Hemispherical-grain (HSG) polysilicon. - 2. 13 Epitaxial realignment. - 2. 14 Summary. - 3. Dopant Diffusion and Segregation. - 3. 1 Introduction. - 3. 2 Diffusion mechanism. - 3. 3 Diffusion in polysilicon. - 3. 4 Diffusion from polysilicon. - 3. 5 Interaction with metals. - 3. 6 Dopant segregation at grain boundaries. - 3. 7 Computer modeling of diffusion. - 3. 8 Summary. - 4. Basic Definitions of The Fuzzy Sets Theory. - 4. 1 Introduction. - 4. 2 Oxide growth on polysilicon. - 4. 3 Conduction through oxide on polysilicon. - 4. 4 Summary. - 5. Basic Definitions of The Fuzzy Sets Theory. - 5. 1 Introduction. - 5. 2 Undoped polysilicon. - 5. 3 Amorphous silicon. - 5. 4 Moderately doped polysilicon. - 5. 5 Grain-boundary modification. - 5. 6 Heavily doped polysilicon. - 5. 7 Minority-carrier properties. - 5. 8 Summary. - 6. Applications. - 6. 1 Introduction. - 6. 2 Silicon-gate MOS transistor. - 6. 3 Nonvolatile memories. - 6. 4 Polysilicon resistors. - 6. 5 Fusible links. - 6. 6 Gettering. - 6. 7 Polysilicon contacts. - 6. 8 Vertical npn bipolar transistors. - 6. 9 Lateral pnp bipolar transistors. - 6. 10 Device isolation. - 6. 11 Dynamic random-access memories. - 6. 12 Polysilicon diodes. - 6. 13 Polysilicon thin-film transistors. - 6. 14 Microelectromechanical Systems. - 6. 15 Summary. Language: English